Optics & Optical Systems, Photon Science Development
Contact[email protected]Mailstop: 2R0400510-486-6153 (Office)
Beamline design for the upgrade of the Advanced Light Source (COSMIC-U, MAESTRO-U, FLEXON, TENDER)
Development of wavefront sensing and x-ray adaptive optics to preserve the diffraction-limited performances of ALS-U.
Antoine Wojdyla has worked on ALS-U since 2016; prior to that he was with the Center for X-Ray Optics at LBNL, where he developed tools for EUV lithography for metrology, full-field imaging and developed computational methods to improve the capability of a state-of-the art EUV microscope (SHARP, sharp.lbl.gov.) He has also worked on fine spectroscopy techniques using x-ray interferometry.
He earned his PhD from Ecole Polytechnique, where he worked on biological imaging with ultra-fast terahertz radiation (“T-rays”), and his Master’s degree from Ecole Centrale in Marseille/Aix-Marseulle University in France.
My research interests cover coherent optics, diffractive optics, computational imaging, metrology, instrument control, both from an experimental and theoretical perspective (simulations and design.)
I am a member of the Advanced Light Source User Executive Committee (ALS UEC, alsuec.org), advocating on behalf of the worldwide ALS user community, and I am in charge of the [email protected] (forum.lbl.gov) which aims at bringing together researchers from the Energy Science Area and foster collaborations between the national users facilities at Berkeley Lab (ALS, Molecular Foundry, NERSC)
“Optical beamline modelling for ALS-U,” A. Wojdyla, K. A. Goldberg, H. Padmore, 6th DLSR Workshop, Berkeley, USA 29-31 October, 2018 (poster)
“Design and demonstration of tunable soft x-ray lateral shearing and Hartmann wavefront sensors,” Antoine Wojdyla, Diane Bryant, Weilun Chao, Lahsen Assoufid, Daniele Cocco, Mourad Idir, Kenneth A. Goldberg, SPIE 10760 1076003, (2018). DOI:10.1117/12.2321642
“EUV photolithography mask inspection using Fourier ptychography,” Antoine Wojdyla, Markus P. Benk, Patrick P. Naulleau, Kenneth A. Goldberg, SPIE 10656 106560W, 106560W (2018). DOI:10.1117/12.2307860
“Field-varying aberration recovery in EUV microscopy using mask roughness,” Gautam Gunjala, Antoine Wojdyla, Aamod Shanker, Stuart Sherwin, Markus P. Benk, Kenneth A. Goldberg, Patrick P. Naulleau, and Laura Waller, Computational Optical Sensing and Imaging CW2E.2, (2018). DOI:10.1364/COSI.2018.CW2E.2
“Aerial imaging study of the mask-induced line-edge roughness of EUV lithography mask,” Antoine Wojdyla, Alexander P. Donoghue, Markus P. Benk, Kenneth A. Goldberg, SPIE 9776 97760H, (2016). DOI:10.1117/12.2219513
“Coded aperture detector : an image sensor with sub 20-nm pixel resolution”
R Miyakawa, R Mayer, A Wojdyla et al. in Optics Express 22, 16 (2014) DOI:10.1364/OE.22.019803
“Attenuated Internal Reflection Terahertz Imaging”
A Wojdyla, G Gallot in Optics Letters 38, 2, pp. 112-114 (2013) DOI:10.1364/OL.38.000112