Optics & Optical Systems, Photon Science Development
Contactawojdyla@lbl.govMailstop: 2R0400510-486-6153 (Office)
Beamline design and simulations for the upgrade of the Advanced Light Source.
Development of wavefront sensing and adaptive optics for soft x-ray beamlines.
Member of the Advanced Light Source Users’ Executive Committee.
Antoine Wojdyla is a research scientist at the Advanced Light Source, a national user facility hosted at Lawrence Berkeley National Laboratory. He currently works on the design and simulation of the feature beamlines for ALS-U, the diffraction-limited storage ring upgrade of the light source, in order to leverage the high brightness and coherence for microscopy and spectroscopy in the soft x-ray regime, for application in physics, chemistry and biology.
His work focuses on the use of diffractive optics, wavefront sensors and deformable mirrors to enable and maintain diffraction-limited performances in insertion device beamlines, developing new technologies for synchrotrons and free-electron lasers. He was previously developing novel imaging techniques for EUV lithography based on the SHARP EUV microscope, in collaboration with semiconductor manufacturing companies such as Intel and Samsung.
He earned his PhD from École Polytechnique and his Master’s degree from Ecole Centrale/Aix-Marseille University (France.)
X-ray microscopy, coherent optics, metrology, diffractive optics, computational imaging, adaptive optics, instrument control
Antoine Wojdyla, Henry P. Alvarez, Maxime Bergeret, Albert Sheng, Diane Bryant, Arnaud P. Allezy, Grand D Cutler, Valeriy V. Yashchuk, Alastair A. MacDowell, Kenneth A Goldberg, Manuel Sanchez del Rio, Simon A. Morton, Elaine DiMasi, Howard A. Padmore, “Preliminary design of a set of four beamlines for the DLSR upgrade of the advanced light source,” Proc. SPIE 11493, Advances in Computational Methods for X-Ray Optics V, 1149304 (25 August 2020); DOI: 10.1117/12.2569298
Gunjala, G., Wojdyla, A., Sherwin, S., Shanker, A., Benk, M. P., Goldberg, K. A., Naulleau, P. P., & Waller, L., “Extreme ultraviolet microscope characterization using photomask surface roughness,” Scientific Reports, 10 (1), 1–11. (2020) DOI: 10.1038/s41598-020-68588-w
Cocco, D., Hardin, C., Morton, D., Lee, L., Ng, M. L., Zhang, L., Assoufid, L., Grizolli, W., Shi, X., Walko, D. A., Cutler, G., Goldberg, K. A., Wojdyla, A., Idir, M., Huang, L., & Dovillaire, G., “Adaptive shape control of wavefront-preserving X-ray mirrors with active cooling and heating,” Optics Express, 28 (13), 19242 (2020). DOI: 10.1364/oe.394310
Sanchez Del Rio, M., Wojdyla, A., Goldberg, K. A., Cutler, G. D., Cocco, D., & Padmore, H. A., “Compensation of heat load deformations using adaptive optics for the ALS upgrade: A wave optics study,” Journal of Synchrotron Radiation, 27, 1141–1152 (2020). DOI: 10.1107/S1600577520009522
Wojdyla, A., Bryant, D., Chao, W., Assoufid, L., Cocco, D., Idir, M., & Goldberg, K. A., “Design and demonstration of tunable soft x-ray lateral shearing and Hartmann wavefront sensors,” Advances in X-Ray/EUV Optics and Components XIII, 1076003 (2018). DOI: 10.1117/12.2321642
Wojdyla, A., Benk, M. P., Naulleau, P. P., & Goldberg, K. A., “EUV photolithography mask inspection using Fourier ptychography,” Image Sensing Technologies: Materials, Devices, Systems, and Applications V (2018). DOI: 10.1117/12.2307860
“Room to shrink“, Berkeley Science Review (2020)
“Cyclotron Valley,” Berkeley Science Review (2015)