For the past 25 years, scientists and engineers from the Center for X-Ray Optics (CXRO) have worked to develop EUV lithography, a technique that enables microchip circuits and transistors that are tens of thousands of times thinner than a strand of human hair. Patrick Naulleau, a CXRO scientist who helped develop EUV lithography, shares his perspective in this Q&A. Read more »
Additive Lithography–Organic Monolayer Patterning Coupled with an Area-Selective Deposition
This scene depicts the layer-by-layer growth of an inorganic film in a selected area. The alternation of a chemical agent (blue) deposits on a gray substrate to form an inorganic film. A cross-linked organic material (tan) locally inhibits this reaction and prevents film deposition. Furthermore, the pattern-wise cross-linking of this organic film enables nanoscale pattern generation. Read more »
