Beamline 11.3.2

EUV Lithography Photomask Imaging (SHARP)

Current status	Operational; restricted access
ALS-U Status	This beamline will temporarily close at the start of the ALS-U dark time and will resume operations after a commissioning period. For more information, see ALS-U Beamline Impacts and other ALS-U web pages.
Source	Bend
Minimum energy (eV)	50
Maximum energy (eV)	1,000
Wavelength range (Å)	10–250
Research areas	Applied Sciences
Technique category	Microscopy/Imaging Full-field x-ray microscopy (XM)
Flux/Brightness	10¹¹ photons/s/0.01%BW at 100 eV
Resolving power	7,000
Access modes	Onsite Remote - ALS-operated
Primary contact(s)	Markus Benk MPBenk@lbl.gov 510-486-5680
Other beamline staff	Kenneth Goldberg KAGoldberg@lbl.gov 510-495-2261
Beamline website	http://sharp.lbl.gov
Beamline phone number	510-495-2113