Beamline 12.0.1
EUV Lithography Nanopatterning (MET/MET5)
- Endstation 12.0.1.2 - EUV Dose Calibration Tool
- Endstation 12.0.1.4 - 0.5 NA EUV Micro-field Exposure Tool (MET5)
| Status | Operational; restricted access |
|---|---|
| Source | U8 |
| Minimum energy (eV) | 92 |
| Maximum energy (eV) | 92 |
| Research areas |
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| Technique category |
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| Flux/Brightness | up to 200 mJ/cm2/s |
| Resolving power | 8 nm (max imaging resolution) |
| Access modes |
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| Additional notes | ALS Beamline 12.0.1 has been an engine for EUV materials learning for 16 years. Testing 1500 new EUV material systems each year, the Microfield Exposure Tool and the Dose Calibration Tool are used by researchers around the world for early learning in key areas such as EUV resists, processing, and masks. |
| Primary contact(s) | Chris Anderson |
| Beamline website | https://met.lbl.gov |
Endstation 12.0.1.2
EUV Dose Calibration Tool
| Status | Operational; limited access |
|---|---|
| Research areas |
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| Spot size | 1 cm square or 500 um circle |
| Field of view/spatial resolution | N/A |
| Sample information | 4" Si wafers |
| Primary contact(s) | Chris Anderson Patrick Naulleau |
| Endstation website | http://met.lbl.gov |
| Endstation phone number | 510-495-2120 |
Endstation 12.0.1.4
0.5 NA EUV Micro-field Exposure Tool (MET5)
| Status | Operational; limited access |
|---|---|
| Research areas |
|
| Spot size | 1000 um x 150 um at the reticle |
| Field of view/spatial resolution | 200 um x 30 um field size @ wafer (5X demagnification). 8 nm imaging resolution |
| Sample information | 8" Si wafers |
| Primary contact(s) | Chris Anderson Patrick Naulleau |
| Endstation website | http://met.lbl.gov |
| Endstation phone number | 510-495-2120 |
