EUV Lithography Nanopatterning (MET/MET5)
| Status | Operational; limited access |
|---|---|
| Source | U8 |
| Minimum energy (eV) | 92 |
| Maximum energy (eV) | 92 |
| Research areas |
|
| Technique category |
|
| Access modes |
|
| Primary contact(s) | Chris Anderson |
| Beamline Schedule |  12.0.pdf |
Endstation 12.0.1.2
| Name/Description | EUV Dose Calibration Tool |
|---|---|
| Status | Operational; limited access |
| Research areas |
|
| Spot size | 500 μm |
| Sample information | 4" Si wafers |
| Primary contact(s) | Chris Anderson Patrick Naulleau |
| Endstation website | http://met.lbl.gov |
| Endstation phone number | 510-495-2120 |
Endstation 12.0.1.3
| Name/Description | EUV Micro-field Exposure Tool (MET) |
|---|---|
| Status | Operational; limited access |
| Research areas |
|
| Spot size | 600 μm x 200 μm |
| Field of view/spatial resolution | 12 nm |
| Sample information | 4" Si wafers |
| Primary contact(s) | Chris Anderson Patrick Naulleau |
| Endstation website | http://met.lbl.gov |
| Endstation phone number | 510-495-2120 |