Beamline 12.0.1
EUV Lithography Nanopatterning (MET/MET5)
| Status | Operational; restricted access |
|---|---|
| Source | U8 |
| Minimum energy (eV) | 92 |
| Maximum energy (eV) | 92 |
| Research areas |
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| Technique category |
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| Access modes |
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| Additional notes | ALS Beamline 12.0.1 has been an engine for 10-nm-node EUV materials learning for over a decade. Testing 1500 new EUV material systems each year, the Microfield Exposure Tool (12.0.1.3) and the Dose Calibration Tool (12.0.1.2) are used by researchers around the world for early learning in key areas such as EUV resists, processing, and masks. |
| Primary contact(s) | Chris Anderson |
Endstation 12.0.1.2
EUV Dose Calibration Tool
| Status | Operational; limited access |
|---|---|
| Research areas |
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| Spot size | 1 cm square or 500 um circle |
| Field of view/spatial resolution | N/A |
| Sample information | 4" Si wafers |
| Primary contact(s) | Chris Anderson Patrick Naulleau |
| Endstation website | http://met.lbl.gov |
| Endstation phone number | 510-495-2120 |
Endstation 12.0.1.3
EUV Micro-field Exposure Tool (MET)
| Status | Operational; limited access |
|---|---|
| Research areas |
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| Spot size | 3 mm x 1 mm at the reticle |
| Field of view/spatial resolution | 600 um x 200 um field size @ wafer (5X demagnification). 12 nm imaging resolution |
| Sample information | 4" Si wafers |
| Primary contact(s) | Chris Anderson Patrick Naulleau |
| Endstation website | http://met.lbl.gov |
| Endstation phone number | 510-495-2120 |
