Beamline 7.0.2
Quantum Materials Growth and Electronic Structure (MAESTRO)
- Endstation 7.0.2.1 - microARPES (µARPES)
- Endstation 7.0.2.2 - nanoARPES (nARPES)
- Endstation 7.0.2.3 - LEEM/PEEM
| Current status | Operational; open to general users |
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| ALS-U Status | This beamline will temporarily close at the start of the ALS-U dark time. It will be upgraded and will resume operations after a commissioning period. For more information, see ALS-U Beamline Impacts and other ALS-U web pages. |
| Source | EPU7 |
| Minimum energy (eV) | 20 |
| Maximum energy (eV) | 1,000 |
| Research areas |
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| Technique category |
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| Flux/Brightness | >3 x 1012 ph/sec at 30,000 resolving power at 65 eV, determined by photodiode |
| Resolving power | 30,000, determined at 65 eV using He(g) absorption |
| Access modes |
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| Primary contact(s) | |
| Other beamline staff | |
| Beamline website | https://sites.google.com/a/lbl.gov/maestro/ |
| Beamline phone number | 510-495-2071 |
Endstation 7.0.2.1
microARPES (µARPES)
| Status | Operational; open to general users |
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| Research areas |
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| Technique category |
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| Spot size | <10 μm |
| Field of view/spatial resolution | 25 mm FOV |
| Sample information | samples 10 μm to 25 mm; 12K-300K; resistive heating; 8 contacts available for sample for transport and gating |
| Additional Notes | R4000 spectrometer with deflectors <10meV total resolution; LEED; detachable evaporator; Au, alkali metal deposition; sputtering |
| Primary contact(s) | Aaron Bostwick (beamline leader) |
| Endstation website | https://sites.google.com/a/lbl.gov/maestro/instrumentation/microarpes |
Endstation 7.0.2.2
nanoARPES (nARPES)
| Status | Operational; open to general users |
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| Research areas |
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| Technique category |
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| Spot size | 1.5um (high flux) / 120 nm (high resolution) |
| Field of view/spatial resolution | 10 mm |
| Sample information | 23K-300K; 8 contacts available for sample for transport and gating; alkali metal deposition |
| Additional Notes | R4000 spectrometer with deflectors <10meV total resolution |
| Primary contact(s) | Aaron Bostwick (beamline leader) |
| Endstation website | https://sites.google.com/a/lbl.gov/maestro/instrumentation/nanoarpes |
Endstation 7.0.2.3
LEEM/PEEM
| Status | Temporarily offline |
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| Research areas |
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| Technique category |
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| Spot size | 80 µm (with synchrotron) > 500 µm with He lamp > 1mm with Hg lamp > 200 nm with electron source |
| Field of view/spatial resolution | 1 mm FOV (with Hg Source), 500 µm FOV (with He source), 80 µm FOV (with synchrotron); resolution down to 35 nm |
| Sample information | 9 mm max diameter (will upgrade later to Omicron holders) |
| Additional Notes | In-situ heating and sample growth; LEEM capability |
| Primary contact(s) | Aaron Bostwick (beamline leader) Eli Rotenberg Chris Jozwiak
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