Beamline 3.2.1
LIGA
| Status | Operational; restricted access |
|---|---|
| Source | Bend |
| Minimum energy (eV) | 3,000 |
| Maximum energy (eV) | 12,000 |
| Research areas |
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| Technique category |
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| Flux/Brightness | ~1018 photons/sec in a 10 x 1 cm spot |
| Resolving power | no monochromator |
| Access modes |
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| Additional notes | Beamline 3.2.1 is used for LIGA, a german language acronym Lithographie, Galvanoformung, Abformung (Lithography, Electroplating, and Moulding) that describes a fabrication technology used to create high-aspect-ratio (HAR) microstructures. The beamline is also used to develop other synchrotron techniques including X-ray Footprinting being performed now at other dedicated beamlines. |
| Primary contact(s) | Andrew Doran
|
| Beamline phone number | 510-495-2032 |
