Beamline 3.2.1
LIGA
| Status | Operational; restricted access |
|---|---|
| Source | Bend |
| Minimum energy (eV) | 2,000 |
| Maximum energy (eV) | 15,000 |
| Research areas |
|
| Technique category |
|
| Flux/Brightness | ~1018 photons/sec in a 10 x 1 cm spot |
| Resolving power | no monochromator |
| Access modes |
|
| Additional notes | Beamline 3.2.1 is used for LIGA, a german language acronym Lithographie, Galvanoformung, Abformung (Lithography, Electroplating, and Moulding) that describes a fabrication technology used to create high-aspect-ratio (HAR) microstructures. The beamline is also used to develop other synchrotron techniques including X-ray Footprinting, which is moving to beamline 3.3.1. |
| Primary contact(s) | Andrew Doran
|
| Beamline phone number | 510-495-2032 |
